F50 - Thin film measurement
F50 - Thin film measurement
Thin-film thickness and n&k are mapped quickly and easily with the F50 advanced spectral reflectance system. The motorized R-0 stage moves automatically to selected measurement points and provides thickness measurements in seconds. Choose one of the dozen+s of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and can be used by anyone with basic computer skills.
- Automated Film Thickness Wafer Mapping System (Blanket Wafers)
–Similar Spectrometer to F20
- Available in 5 Different Wavelength Configurations
–VIS, UV, NIR, EXR, XT
- Available Substrate Configurations
–200mm, 300mm (Square, Custom)
- Wafer Based Applications for Within-Wafer Trends
Characteristics :
- Filmetrics makes products that can be used by non-experts to make reliable measurements with minimal effort.
- Easy-to-operate: powerful, yet simple GUI
- Many important features developed from years of experience (i.e. multiple lens assemblies, stages, DDE, FFT, etc.)
- Able solve almost any problem with current products
- Accurate, robust solving algorithms
- We know what materials can and cannot be measured with spectral reflectance.
Applications :
- SEMICONDUCTOR FABRICATION
Photoresist /
Oxides /
Nitride / Polysilicon
- OPTICAL COATINGS
Hardness Coatings /
Anti-Reflection /
Coating /
Filters
- LIQUID CRYSTAL DISPLAYS
Cell gaps /
Polyimide
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