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Vous êtes ici : Accueil > Produits > Automated Film Thickness Mapping – up to 200mm

Automated thin-film thickness mapping

F54-xy-200-front-large

F54- XY-200

1. Sample up to 200mm in diameter

2. Automated XY stage

3. Thin, thick, rough and opaque films

Thin-film thickness on samples up to 200mm by 200mm is easily mapped with the F54-XY-200 advanced spectral reflectance system. The motorized X-Y stage moves automatically to specified measurement locations, facilitating thickness measurements as quickly as two points per second.

  • F50 Serie : Customizable thickness mapping - best cost/effective solution. More information >
  • F54 Serie : Fine spot size - sample up to 450mm in diameter - R&D.  More information >
  • F60 Serie: High automation - notch detection - SECS / GEM interface. More information >

Reflectometry

F20

F20 :
Spot measurement >>

F40

F40 :
Adaptable to microscope >>

Inline-monitoring-f30

F30 :
Multi sites/ In-Situ >>

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Applications Features Accessories Specifications
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Applications 

  • Semiconductor manufacturing

    • Photoresist
    • Oxides / Nitrides / SOI
    • Wafer grinding

    MEMS

    • Photoresist
    • Silicon membranes
    • Dielectric stacks

    LCD

    • Cell gaps
    • Polyimide
    • ITO

    Optical coatings

    • Hardness coatings
    • Anti-reflective coating
    • Filters
Photoresist image
Process film image
Oled image
Medical devices image

More info on applications

- Amorphous and polysilicon
- Dielectric
- Hard thickness
- IC failure analysis
- ITO and other TCO
- Medical equipement
- Metal thickness
- Microfluidics
- OLED
- Ophthalmic coatings
- Parylene Coatings
- Photoresist
- Porous silicon
- Treatment films
- Refractive index & k
- Wafers and membranes of silicon
- Solar applications
- Semiconductor teaching laboratories
- Roughness and surface finish

Thin-Film Mapping Analyzer Automated Thin-Film Thickness Mapping System

Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points.

The table-top instrument connects to the USB port of your Windows® computer, can be set up in minutes and can be used by anyone with basic computer skills.

The different models are distinguished primarily by thickness and wavelength range. Generally, shorter wavelengths (e.g. F54-XY-200-UV) are required for measurement of thinner films, while longer wavelengths allow measurement of thicker, rougher, and more opaque films.

What’s Included

  • Integrated spectrometer/light source unit
  • FILMapper measurement software
  • SiO2 on Si Thickness standard
  • Integrated Silicon reflectance standard
  • Vacuum pump
  • Spare TH-1 lamp
F54-xy-200-screen-large

ADVANTAGES

- Sample up to 200mm in diameter

- Automated XY stage

- Thin, thick, rough and opaque films

Accessories

Nist

NIST-traceable thickness standard

Specifications

Model Specifications 

Model Thickness Range* Wavelength Range
F54-XY-200 20nm - 45µm 380-1050nm
F54-XY-200-UV 4nm - 35µm 190-1100nm
F54-XY-200-NIR 100nm - 115µm 950-1700nm
F54-XY-200-EXR 20nm - 115µm 380-1700nm
F54-XY-200-UVX 4nm - 115µm 190-1700nm

 

*film stack dependent

Thickness Range*

F54xy-spec

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